4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle
  6. Analysis and verification

Benjamen Michael Rathsack

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EDA methodology for extending ghost feature beyond notched...

Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Reexamination Certificate

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System and method for making photomasks

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate

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Two-print two-etch method for enhancement of CD control...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Use of dual mask processing of different composition such as...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
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Profile ID: LFUS-PAI-P-2157975

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