Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1996-06-14
1999-09-14
Russel, Jeffrey E.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
118722, 118723R, 134 12, 422241, 427249, B01J 1902, H05H 100
Patent
active
059520604
ABSTRACT:
An apparatus for processing substrates that includes a processing chamber having an interior surface at least partially coated with a carbon-based coating. The carbon-based coating protects the interior of the chamber from etching gases and other reactants used during substrate processing. The coating also resists accumulation of residues, does not generate particulates and seals in impurities residing in the coated materials. In preferred embodiments the carbon-based coating is either diamond or a diamond-like carbon (DLC) coating. Also described is a process for protecting a processing chamber's interior surface from the reactants used in substrate processing by coating at least portions of the surface with such a carbon-based coating.
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Applied Materials Inc.
Russel Jeffrey E.
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