Use of carbon-based films in extending the lifetime of substrate

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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118722, 118723R, 134 12, 422241, 427249, B01J 1902, H05H 100

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active

059520604

ABSTRACT:
An apparatus for processing substrates that includes a processing chamber having an interior surface at least partially coated with a carbon-based coating. The carbon-based coating protects the interior of the chamber from etching gases and other reactants used during substrate processing. The coating also resists accumulation of residues, does not generate particulates and seals in impurities residing in the coated materials. In preferred embodiments the carbon-based coating is either diamond or a diamond-like carbon (DLC) coating. Also described is a process for protecting a processing chamber's interior surface from the reactants used in substrate processing by coating at least portions of the surface with such a carbon-based coating.

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