4. Coating processes
  5. Direct application of electrical, magnetic, wave, or...
  6. Plasma

Kramadhati Ravi

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Method and apparatus for the use of diamond films as dielectric

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent

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Method for manufacturing porous silicon

Etching a substrate: processes – Etching to produce porous or perforated article
Reexamination Certificate

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Method for manufacturing porous silicon

Etching a substrate: processes – Etching to produce porous or perforated article
Reexamination Certificate

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Use of carbon-based films in extending the lifetime of substrate

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent

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Profile ID: LFUS-PAI-P-1509671

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