Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1999-03-18
2000-07-11
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430522, 430159, 430166, 430155, G03F 711
Patent
active
060870680
ABSTRACT:
Proposed is a novel undercoating composition to form an undercoating layer interposed between the surface of a substrate and a photoresist layer with an object to decrease the adverse influences by the reflection of light on the substrate surface in the pattern-wise exposure of the photo-resist layer to ultraviolet light without the undesirable phenomena of intermixing between layers and notching along with a large selectivity ratio in the etching rates between the patterned resist layer and the undercoating layer in a dry-etching treatment. The undercoating composition comprises (A) an ultraviolet absorber which is a benzophenone compound or an aromatic azomethine compound each having at least one unsubstituted or alkyl-substituted amino group on the aryl groups and (B) a crosslinking agent which is preferably a melamine compound having at least two methylol groups or alkoxymethyl groups bonded to the nitrogen atoms in a molecule in a weight proportion (A):(B) in the range from 1:1 to 1:10.
REFERENCES:
patent: 4197392 (1980-04-01), Moore
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5234990 (1993-08-01), Flaim et al.
patent: 5294680 (1994-03-01), Knors et al.
patent: 5478692 (1995-12-01), Doi et al.
patent: 5498514 (1996-03-01), Nakao et al.
patent: 5599653 (1997-02-01), Nakao et al.
patent: 5652317 (1997-07-01), McCulloch et al.
patent: 5756255 (1998-05-01), Sato et al.
Patent Abstracts of Japan, vol. 010, No. 075 (E-390).
Gurevich et al., 100:140880, English Abstract of SU 1052529A1, Chemical Abstracts, ASC (1998).
Gurevich et al., 84-176028, English Abstract of SU 1052529A dated Nov. 7, 1983, WPIDS, Derwent Limited (1998).
RN 90-94-8, Registry, ACS (1998).
RN 108231-46-5, Registry, ACS (1998).
Daehre et al., Plaste und Kautschuk, 33, Jahrgang Heft 11/1986, pp. 431-436 (1986).
Daehre et al., 106:196890, Chemical Abstracts (online), ACS (1998).
Iguchi Etsuko
Ishikawa Kiyoshi
Kaneko Fumitake
Oomori Katsumi
Sato Mitsuru
Hamilton Cynthia
Tokyo Ohka Kogyo Co. Ltd.
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