Coating apparatus – Gas or vapor deposition
Patent
1993-01-06
1994-10-04
Bueker, Richard
Coating apparatus
Gas or vapor deposition
118725, 118733, 156345, C23C 1600
Patent
active
053522931
ABSTRACT:
The present invention relates to a tube apparatus for manufacturing a semiconductor device, comprising a one-piece cylindrical tube having a door for loading a semiconductor wafer. One end of the tube is closed and two openings are formed adjacent thereto. The other end is conical and has an opening formed in the apex thereof. A saddle having two openings is mounted on the tube so that the two openings of the saddle correspond to the two openings of the tube which are adjacent to the closed end. Using the tube apparatus enhances the efficiency of a diffusion process. Contaminant residue does not remain in the process tube because the temperature therein is more uniform over the length of the tube, compared to a conventional apparatus. The tube can therefore be used semi-permanently.
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An Jun-geen
An Jung-soo
Ryu Kyu-bok
Yang Chang-jip
Bueker Richard
Samsung Electronics Co,. Ltd.
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