Treatment of planarizing layer in multilayer electron beam resis

Details Treatment of planarizing layer in multilayer electron beam resis Treatment of planarizing layer in multilayer electron beam resis

1985-11-25

1987-10-27

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430227, 430313, 430323, 430325, 430326, 430272, G03C 500, G03F 726

Patent

active

047029935

ABSTRACT:
An improved electron beam resist structure comprises an organic planarizing layer which has been treated with an ion beam for a time sufficient to render it conductive and an electron beam resist layer thereover. The electron beam resist layer is preferably oxygen plasma resistant. When the resist layer is not resistant to oxygen plasma and it is desired to develop the planarizing layer by oxygen plasma, the structure additionally includes a thin hard mask layer, suitably of silicon dioxide, interposed between the conductive planarizing layer and the resist layer.

REFERENCES:
patent: 4068018 (1978-01-01), Hashimoto et al.
patent: 4396702 (1983-08-01), Desai et al.
patent: 4410611 (1983-10-01), MacIver
patent: 4436797 (1984-03-01), Brady et al.
patent: 4511445 (1985-04-01), Forrest et al.
E. Ong and E. L. Hu, "Multilayer Resists for Fine Line Optical Lithography" Solid State Technology, June 1984, pp. 155-160.
L. V. Gregor and J. G. Wise, "Three-Layer Electron-Beam Resist with High Sensitivity and Contrast", IBM Technical Disclosure Bulletin, vol. 26, No. 11, Apr. 1984, p. 6141.
Wijdenes et al., SPIE, vol. 539, pp. 97-101 (1985).
Tsuji et al., "Submicron Optical Lithography Using a Double Layer Resist by a Single Development Technology" IEEE VLSI Conf. in Kobe, Japan in May, 1985.
Dobkin et al., IEEE Electron Device Letters, vol. Edl-2, No. 9, pp. 222-224, 1981.
Patton, "Paint Flow and Pigment Dispension", John Wiley & Sons, pp. 244 and 245, 1979.

Affiliated with

Also associated with

Rating

Treatment of planarizing layer in multilayer electron beam resis does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Treatment of planarizing layer in multilayer electron beam resis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Treatment of planarizing layer in multilayer electron beam resis will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1272004