Three-dimensional device layout with sub-groundrule features

Details Three-dimensional device layout with sub-groundrule features Three-dimensional device layout with sub-groundrule features

1996-11-01

1999-04-13

Brown, Peter Toby

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

438245, 438248, 438249, 438386, 438388, 438391, 438392, H01L 218242

Patent

active

058937358

ABSTRACT:
Method for forming three-dimensional device structures comprising a second device having sub-groundrule features formed over a first device is disclosed. A layer having a single crystalline top surface is formed above the first device to provide the base for forming the active area of the second device. the sub-groundrule feature is formed using mandrel and spacers.

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patent: 5302541 (1994-04-01), Akazawa
patent: 5627092 (1997-05-01), Alsmeier et al.
patent: 5705414 (1998-01-01), Lustig
patent: 5731217 (1998-03-01), Kadosh et al.
patent: 5744386 (1998-04-01), Kenny
patent: 5780332 (1998-07-01), Ozaki
patent: 5792685 (1998-08-01), Hammerl et al.

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