Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1987-04-03
1989-02-21
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430324, 430326, 427 57, 427425, G03C 500
Patent
active
048064556
ABSTRACT:
Application of a high temperature resistant film forming polymer has previously proved successful in stabilizing photoresist image layers, particularly those used for high resolution geometries in microelectronic applications, against distortion or degradation by the heat generated during subsequent etching, ion implantation processes and the like. It has been found that, when the thickness of the photoresist image layer exceeds about 1 micron, the coating of the film forming polymer tends to distort and/or cause cracks, breaks and the like in the photoresist resulting in loss of the required geometry in the image. In accordance with the invention this problem can be overcome by applying the film forming polymer in the form of an ultrasonically atomized spray under controlled conditions.
REFERENCES:
patent: 2992919 (1961-07-01), Beeler et al.
patent: 3459128 (1969-08-01), Erdmann et al.
patent: 4659014 (1987-04-01), Soth et al.
patent: 4701390 (1987-10-01), Grunwald et al.
Dees Jos,e G.
MacDermid Incorporated
LandOfFree
Thermal stabilization of photoresist images does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thermal stabilization of photoresist images, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal stabilization of photoresist images will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1521703