Thermal management of inductively coupled plasma reactors

Details Thermal management of inductively coupled plasma reactors Thermal management of inductively coupled plasma reactors

2005-08-09

2010-10-12

Alejandro, Luz L. (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With radio frequency antenna or inductive coil gas...

C118S7230IR, C118S7230AN

Reexamination Certificate

active

07811411

ABSTRACT:
An RF coil assembly provides a source to generate a plasma inductively in a process chamber. The RF coil assembly includes an RF coil disposed about a perimeter of the processing chamber and a frame disposed about a perimeter of the processing chamber. The frame is adapted to support the RF coil in position. An interface material is disposed between and in thermal contact with the frame and a sidewall of the processing chamber. The interface material has a thermal conductivity of 4.0 W/mK or greater.

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D. Knightbridge: “Take the TEMA Test Heat Exchanger Selection” Process Engineering, Apr. 2005 pp. 20-21, XP008071777 UK; the whole document.

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