System, method and medium for modeling, monitoring and/or...

Details System, method and medium for modeling, monitoring and/or... System, method and medium for modeling, monitoring and/or...

2005-09-13

2005-09-13

Whitehead, Jr., Carl (Department: 2829)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

Reexamination Certificate

active

06943053

ABSTRACT:
A method, system, and medium of spectroscopically modeling and/or controlling a semiconductor manufacturing process. The modeling/controlling includes the steps of conducting a plurality of semiconductor manufacturing process runs by changing at least one of process parameters from its target value, and collecting spectral data indicative of the light emitted by plasma during each of said semiconductor manufacturing process runs. The modeling/controlling also includes the step of formulating a ratio based on a relationship between the collected spectral data and the changes in the at least one of the plurality of process parameters.

REFERENCES:
patent: 5270222 (1993-12-01), Moslehi
patent: 6413867 (2002-07-01), Sarfaty et al.
patent: 6521080 (2003-02-01), Balasubramhanya et al.
patent: 6589869 (2003-07-01), Sarfaty et al.

Affiliated with

Also associated with

Rating

System, method and medium for modeling, monitoring and/or... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System, method and medium for modeling, monitoring and/or..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System, method and medium for modeling, monitoring and/or... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3399121