Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate
2011-04-19
2011-04-19
Do, Thuan (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Analysis and verification
C716S050000, C716S051000, C716S052000, C716S054000, C716S056000, C430S005000, C430S030000
Reexamination Certificate
active
07930656
ABSTRACT:
The present disclosure is directed a method for preparing photomask patterns. The method comprises receiving drawn pattern data for a design database. The drawn pattern data describes first device features and second device features, the second device features being associated with design specifications for providing a desired connectivity of the first device features to the second device features. At least a first plurality of the first device features have drawn patterns that will not result in sufficient coverage to effect the desired connectivity. Photomask patterns are formed for the first device features, wherein the photomask patterns for the first plurality of the first device features will result in the desired coverage. Integrated circuit devices formed using the principles of the present disclosure are also taught.
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Aton Thomas J.
Blatchford James Walter
Johnson Frank Scott
McKee Benjamin
Rathsack Benjamen Michael
Brady III Wade J.
Do Thuan
Franz Warren L.
Nguyen Nha T
Telecky , Jr. Frederick J.
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