System and method for integrated multi-use optical alignment

Details System and method for integrated multi-use optical alignment System and method for integrated multi-use optical alignment

2005-10-04

2005-10-04

Gregory, Bernarr E. (Department: 3662)

Optics: measuring and testing

Angle measuring or angular axial alignment

Apex of angle at observing or detecting station

C356S139030, C356S140000, C356S620000, C356S622000

Reexamination Certificate

active

06952255

ABSTRACT:
An optical alignment system for use in a semiconductor processing system is provided. The optical alignment system includes a wafer chuck that has an alignment feature integrated into the top surface of the wafer chuck. In addition, a beam-forming system, which is capable of emitting an optical signal onto the alignment feature, is disposed above the wafer chuck. Also, a detector is included that can detect an amplitude of the optical signal emitted onto the alignment feature. In one aspect, the alignment feature can be a reflective alignment feature that reflects a portion of the optical signal back to the beam detector. In additional aspect, the alignment feature can be a transmittance alignment feature capable of allowing a portion of the optical signal to pass through the wafer chuck to the detector. In this aspect, the detector can be disposed below the wafer chuck.

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