Surface barrier silylation of novolak film without photoactive a

Details Surface barrier silylation of novolak film without photoactive a Surface barrier silylation of novolak film without photoactive a

1989-10-18

1992-08-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430309, 430315, 430945, G03C 500, G03F 700

Patent

active

051399253

ABSTRACT:
A resist exposed to patterned radiation at 193 nm forms a highly crosslinked barrier layer in the exposed regions of the resist surface. The complementary surface regions are silylated in a silicon-containing reagent, and the exposed regions are readily removed by a oxygen RIE plasma. The laser exposure is a reciprocal process allowing precise control. Pattern definition is enhanced by limiting the exposure and the silylation to the surface of the resist.

REFERENCES:
patent: 4552833 (1985-11-01), Ito et al.
patent: 4613398 (1986-09-01), Chiong et al.
patent: 4614706 (1986-09-01), Matsuzawa et al.
patent: 4657845 (1987-04-01), Frechet et al.
patent: 4737425 (1988-04-01), Lin et al.
patent: 4782008 (1988-11-01), Babich et al.
patent: 4803181 (1989-02-01), Buchmann et al.
patent: 4808511 (1989-02-01), Holmes
patent: 4810601 (1989-03-01), Allen et al.
"Chemical Reactions Induced by Soft X-ray and E-beam Exposure of Novolec-Based Resists", Derrick C. Mancini et al.
"An optimized positive resist for electron-beam direct writing: PER-1" Yasuo Lida et al.
"The Mechanism of the Desire Process" B. Roland et al.
"Single Level Dry Developable Resist Systems, Based on Gas Phase Silylation" Schellekens et al.
Visser et al, "Mechanism and Kinetics of Silylation of Resist Layers from the Gas Phase", Proceedings of SPIE, vol. 771 (1987), pp. 1-7.

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