4. Adhesive bonding and miscellaneous chemical manufacture
  5. Delaminating processes adapted for specified product
  6. Delaminating in preparation for post processing recycling step

Mark A. Hartney

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Method of patterning a phenolic polymer film without photoactive

Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Patent

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Positive resist pattern formation through focused ion beam expos

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent

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Processes involving lithographic materials

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent

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Surface barrier silylation of novolak film without photoactive a

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent

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Profile ID: LFUS-PAI-P-283776

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