Structure and method of a strained channel transistor and a...

Details Structure and method of a strained channel transistor and a... Structure and method of a strained channel transistor and a...

2006-09-26

2006-09-26

Vu, Hung (Department: 2811)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S429000

Reexamination Certificate

active

07112495

ABSTRACT:
A semiconductor chip includes a semiconductor substrate126, in which first and second active regions are disposed. A resistor124is formed in the first active region and the resistor124includes a doped region128formed between two terminals136. A strained channel transistor132is formed in the second active region. The transistor includes a first and second stressor141, formed in the substrate oppositely adjacent a strained channel region143.

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