Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-02-08
2005-02-08
Niebling, John F. (Department: 2812)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S305000, C438S430000
Reexamination Certificate
active
06852600
ABSTRACT:
A strained silicon MOSFET utilizes a strained silicon layer formed on a silicon geranium layer. Strained silicon and silicon germanium are removed at opposing sides of the gate and are replaced by silicon regions. Deep source and drain regions are implanted in the silicon regions, and the depth of the deep source and drain regions does not extend beyond the depth of the silicon regions. By forming the deep source and drain regions in the silicon regions, detrimental effects of the higher dielectric constant and lower band gap of silicon geranium are reduced.
REFERENCES:
patent: 5266813 (1993-11-01), Comfort et al.
patent: 5943575 (1999-08-01), Chung
patent: 6071783 (2000-06-01), Liang et al.
patent: 6091076 (2000-07-01), Deleonibus
patent: 6492216 (2002-12-01), Yeo et al.
patent: 6503833 (2003-01-01), Ajmeral et al.
patent: 6509586 (2003-01-01), Awano
patent: 6555880 (2003-04-01), Cabral, Jr. et al.
patent: 6657223 (2003-12-01), Wang et al.
patent: 6703648 (2004-03-01), Xiang et al.
patent: 6730576 (2004-05-01), Wang et al.
patent: 20020109135 (2002-08-01), Murota et al.
patent: 20030057439 (2003-03-01), Fitzgerald
patent: 20030102490 (2003-06-01), Kubo et al.
Wang Haihong
Xiang Qi
Advanced Micro Devices , Inc.
Lindsay Jr. Walter L.
Niebling John F.
LandOfFree
Strained silicon MOSFET having silicon source/drain regions... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Strained silicon MOSFET having silicon source/drain regions..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Strained silicon MOSFET having silicon source/drain regions... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3450898