Sputter apparatus with a pipe cathode and method for...

Details Sputter apparatus with a pipe cathode and method for... Sputter apparatus with a pipe cathode and method for...

2006-08-03

2010-11-30

Nguyen, Nam X (Department: 1795)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S298210

Reexamination Certificate

active

07842167

ABSTRACT:
A sputter apparatus with a pipe cathode is arranged such that the supply of power, cooling fluid and other media to the pipe cathode takes place via flexible lines or tubes which can be wound about a receptor. If the pipe cathode completes a pendulum movement, the lines and/or tubes are wound onto the receptor or wound from it. The pendulum movement of the pipe cathode is preferably such that the pipe cathode is rotated by a certain first angle in a first direction and subsequently by a certain second angle in a second direction, the second angle differing from the first angle. Methods for operating the sputter apparatus are also disclosed.

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Machine Translation to Susaki 10-109834 published on Apr. 1998.
Wright, et al., Design Advances and Applications of the Rotatable Cylindrical Magnetron, J. Vac. Sci. Technol. (1986).

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