Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
Examiner
active
No affiliations
Apparatus for plasma-enhanced physical vapor deposition of...
Cylindrical target with oscillating magnet for magnetron...
Low-frequency bias power in HDP-CVD processes
Method and apparatus for forming thin film
Method for plasma-enhanced physical vapor deposition of...
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Profile ID: LFUS-PAI-P-2282391