Small scanned magentron

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Reexamination Certificate

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Reexamination Certificate

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07807030

ABSTRACT:
A small magnet assembly having a magnet assembly of area less than 10% of the target area, is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly passes through the target center, thus allowing full target coverage. A properly chosen ratio of the two rotations about respective axes produces a much slower magnet velocity near the target periphery than at the target center. A geared planetary mechanism includes a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plane supporting a cantilevered magnet assembly on the side of the drive plate facing the target.

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Translation of JP 11-74225 dated Mar. 1999 attached to Japanese document.
J. Musil et al., “Unbalanced magnetrons and new sputtering systems with enhanced plasma ionization”,J. Vac. Sci. Technol. A,vol. 9, No. 3, May/Jun. 1991, 1171-1177 pp.
PCT/US03/15620, International Search Report, 7 pp.

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