Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2006-12-14
2010-10-05
McDonald, Rodney G (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
Reexamination Certificate
active
07807030
ABSTRACT:
A small magnet assembly having a magnet assembly of area less than 10% of the target area, is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly passes through the target center, thus allowing full target coverage. A properly chosen ratio of the two rotations about respective axes produces a much slower magnet velocity near the target periphery than at the target center. A geared planetary mechanism includes a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plane supporting a cantilevered magnet assembly on the side of the drive plate facing the target.
REFERENCES:
patent: 4426264 (1984-01-01), Munzel et al.
patent: 4444643 (1984-04-01), Garrett
patent: 4714536 (1987-12-01), Freeman et al.
patent: 5126029 (1992-06-01), Tomer et al.
patent: 5188717 (1993-02-01), Broadbent et al.
patent: 5944968 (1999-08-01), Kobayahi et al.
patent: 6183614 (2001-02-01), Fu
patent: 6322679 (2001-11-01), DeBosscher et al.
patent: 6416639 (2002-07-01), DeBosscher et al.
patent: 6841050 (2005-01-01), Hong et al.
patent: 6852202 (2005-02-01), Miller et al.
patent: 7169271 (2007-01-01), Hong et al.
patent: 0 801 416 (1997-03-01), None
patent: 61-157678 (1984-12-01), None
patent: 3-140467 (1991-06-01), None
patent: 5-1373 (1993-01-01), None
patent: 11-074225 (1999-03-01), None
patent: 11-74225 (1999-03-01), None
patent: W/O 90/13137 (1990-11-01), None
patent: WO 00/48226 (2000-08-01), None
Translation of JP 11-74225 dated Mar. 1999 attached to Japanese document.
J. Musil et al., “Unbalanced magnetrons and new sputtering systems with enhanced plasma ionization”,J. Vac. Sci. Technol. A,vol. 9, No. 3, May/Jun. 1991, 1171-1177 pp.
PCT/US03/15620, International Search Report, 7 pp.
Ding Peijun
Hong Ilyoung Richard
Lubben Daniel Clarence
Maity Nirmalya
Tsung James
Applied Materials Inc.
Law Offices of Charles Guenzer
McDonald Rodney G
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