Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...
Reexamination Certificate
2011-08-30
2011-08-30
Vinh, Lan (Department: 1713)
Etching a substrate: processes
Nongaseous phase etching of substrate
Using film of etchant between a stationary surface and a...
C216S037000, C216S067000, C216S099000, C216S102000, C438S689000, C438S690000, C438S691000, C438S692000, C051S307000, C051S308000, C051S309000
Reexamination Certificate
active
08007676
ABSTRACT:
A slurry composition includes an acidic aqueous solution and one or both of, an amphoteric surfactant and a glycol compound. Examples of the amphoteric surfactant include a betaine compound and an amino acid compound, and examples of the amino acid compound include lysine, proline and arginine. Examples of the glycol compound include diethylene glycol, ethylene glycol and polyethylene glycol.
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Ahn Bong-Su
Kang Kyoung-Moon
Kim Nam-Soo
Lee Dong-jun
Moon Sung-Taek
Angadi Maki
Samsung Electronics Co,. Ltd.
Vinh Lan
Volentine & Whitt PLLC
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