Coating apparatus – Gas or vapor deposition – Chamber seal
Patent
1995-03-31
1996-12-03
Kunemund, Robert
Coating apparatus
Gas or vapor deposition
Chamber seal
251328, 220378, C23C 1600
Patent
active
055797180
ABSTRACT:
An improved slit valve door for sealing an aperture in the wall of a semiconductor process chamber. The slit valve door consists of an aperture cover plate with a recess in it for receiving a removable insert. An O-ring seal is placed over the insert, and when the insert is placed in the recess of the aperture cover plate, the O-ring moves into an O-ring seat in the aperture cover plate. As the insert seats in the recess and is secured to the cover plate by means of screws protruding from the floor of the recess, a dovetail groove is formed which retains the O-ring.
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Applied Materials Inc.
Kunemund Robert
Lund Jeffrie R.
Opperman Craig P.
Weise Leslie
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