Slit valve door

Coating apparatus – Gas or vapor deposition – Chamber seal

Patent

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Details

251328, 220378, C23C 1600

Patent

active

055797180

ABSTRACT:
An improved slit valve door for sealing an aperture in the wall of a semiconductor process chamber. The slit valve door consists of an aperture cover plate with a recess in it for receiving a removable insert. An O-ring seal is placed over the insert, and when the insert is placed in the recess of the aperture cover plate, the O-ring moves into an O-ring seat in the aperture cover plate. As the insert seats in the recess and is secured to the cover plate by means of screws protruding from the floor of the recess, a dovetail groove is formed which retains the O-ring.

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