Single transistor vertical memory gain cell

Static information storage and retrieval – Systems using particular element – Semiconductive

Reexamination Certificate

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C365S185050, C365S185200, C365S185180

Reexamination Certificate

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07149109

ABSTRACT:
A high density vertical single transistor gain cell is realized for DRAM operation. The gain cell includes a vertical transistor having a source region, a drain region, and a floating body region therebetween. A gate opposes the floating body region and is separated therefrom by a gate oxide on a first side of the vertical transistor. A floating body back gate opposes the floating body region on a second side of the vertical transistor and is separated therefrom by a dielectric to form a body capacitor.

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