Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-01-11
2005-01-11
VerSteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192120, C204S192260
Reexamination Certificate
active
06841045
ABSTRACT:
A method of deposition of a phosphor in a single-source sputtering process, in which the phosphor is selected from the group consisting of ternary, quaternary or higher thioaluminate, thiogallate and thioindate phosphors, and composites thereof, synthesized with cations selected from Groups IIA and IIB of the Periodic Table of Elements. The phosphor is of a pre-determined composition of elements. The method comprising sputtering in a hydrogen sulphide atmosphere from a single source composition so as to deposit a composition on a substrate. The composition of the targets of the single source has a relative increase in concentration of elements of the phosphor that have a lower atomic weight compared to other elements in said phosphor. The relative increase is controlled such that deposition of the pre-determined composition is effected on the substrate. Preferred phosphors are barium thioaluminate (BaAl2S4:Eu), and barium magnesium thioaluminates.
REFERENCES:
patent: 4389295 (1983-06-01), Davey et al.
patent: 4675092 (1987-06-01), Baird et al.
patent: 4725344 (1988-02-01), Yocom et al.
patent: 5309070 (1994-05-01), Sun et al.
patent: 5432015 (1995-07-01), Wu et al.
patent: 5444268 (1995-08-01), Miyakoshi et al.
patent: 5747929 (1998-05-01), Kato et al.
patent: 5780966 (1998-07-01), Kato et al.
patent: WO 0070917 (2000-11-01), None
Benalloul P. et al.: “IIA-II2-S4 Ternary Compounds: New Host Matrices for Full Color Thinfilm Electroluminescence Displays” Applied Physics Letters, American Institute of Physics, New York, U.S. vol. 63, No. 14, 4 OC 1993 (Oct. 4, 1993), pp. 1954-19556, XP000397851 ISSN: 003-6951, the whole document.
International Search Report for PCT/CA 02/00688, completed 11SE2002, mailed 17 SE 2002.
Fay Sharpe Fagan Minnich & McKee LLP
iFire Technology Inc.
VerSteeg Steven
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