Silicon-containing structure with deep etched features, and...

Details Silicon-containing structure with deep etched features, and... Silicon-containing structure with deep etched features, and...

2005-08-29

2009-11-17

Olsen, Allan (Department: 1792)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S039000, C216S046000, C216S067000, C216S079000, C438S792000

Reexamination Certificate

active

07618548

ABSTRACT:
We have developed an uncomplicated method of plasma etching deeply recessed features such as deep trenches, of at least 5 μm in depth, in a silicon-containing substrate, in a manner which generates smooth sidewalls, having a roughness of less than about 1 μm, typically less than about 500 nm, and even more typically between about 100 nm and 20 nm. Features having a sidewall taper angle, relative to an underlying substrate, typically ranges from about 85° to about 92° and exhibiting the smooth sidewalls are produced by the method. In one embodiment, a stabilizing etchant species is used constantly during the plasma etch process, while at least one other etchant species and at least one polymer depositing species are applied intermittently, typically periodically, relative to each other. In another embodiment, the stabilizing etchant species is used constantly and a mixture of the other etchant species and polymer depositing species is used intermittently.

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