Showerhead for a gas supplying apparatus

Details Showerhead for a gas supplying apparatus Showerhead for a gas supplying apparatus

1994-12-08

1997-04-29

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118719, 118725, C23C 1600

Patent

active

056244983

ABSTRACT:
A gas supply apparatus, for use in a semiconductor device manufacturing process, provides a showerhead for evenly supplying various kinds of gases to a reaction chamber. The gas supplying apparatus for use in the formation of a thin film of a semiconductor device includes a first porous plate having a plurality of first holes formed throughout its surface, and a central bore formed at its center; and a second porous plate having first projections which are regularly formed throughout its central portion, and second projections which contain depressions continuously formed around the first projections. The gas supplying apparatus evenly distributes gas into the reaction chamber, thereby improving the uniformity of the film thickness to be grown on a substrate.

REFERENCES:
patent: 4209357 (1980-06-01), Gorin
patent: 4951603 (1990-08-01), Yoshino
patent: 5252131 (1993-10-01), Kiyama

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