4. Coating apparatus
  5. Gas or vapor deposition

Kazuyuki Fujihara

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Method for forming SOI substrate

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
Reexamination Certificate

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Oral preparations with favorable disintegration characteristics

Drug – bio-affecting and body treating compositions – Preparations characterized by special physical form – Particulate form
Reexamination Certificate

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Showerhead for a gas supplying apparatus

Coating apparatus – Gas or vapor deposition
Patent

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Profile ID: LFUS-PAI-P-921891

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