Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2008-04-01
2008-04-01
Estrada, Michelle (Department: 2823)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S618000, C257SE21170, C257SE21280, C257SE21584, C257SE23019, C257SE23144
Reexamination Certificate
active
07351656
ABSTRACT:
A method for manufacturing a semiconductor device includes heating a substrate having an insulation film thereon to a first substrate temperature so that oxidizing species are emitted from the insulating film, the insulating film having a recessed portion formed in a surface thereof, forming a metal film on the insulating film at a second substrate temperature lower than the first substrate temperature, and oxidizing at least part of the metal film with oxidizing species remaining in the insulating film.
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Hasunuma Masahiko
Hatano Masaaki
Higashi Kazuyuki
Katata Tomio
Kinoshita Kazuya
Estrada Michelle
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaihsa Toshiba
Stark Jarrett J
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