Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal
Reexamination Certificate
2007-06-19
2007-06-19
Parker, Kenneth (Department: 2815)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
C438S060000, C438S144000, C438S424000, C438S425000, C438S439000, C438S786000, C257SE21551
Reexamination Certificate
active
10818312
ABSTRACT:
Provided are a semiconductor device and a method for its manufacture. In one example, the method includes forming an isolation structure having a first refraction index over a sensor embedded in a substrate. A first layer having a second refraction index that is different from the first refraction index is formed over the isolation structure. The first layer is removed from at least a portion of the isolation structure. A second layer having a third refraction index is formed over the isolation structure after the first layer is removed. The third refraction index is substantially similar to the first refraction index.
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Chien Ho-Ching
Hsu Tzu-Hsuan
Lin Jeng-Shyan
Tseng Chien-Hsien
Wuu Shou-Gwo
Diaz José R.
Haynes and Boone LLP
Parker Kenneth
Taiwan Semiconductor Manufacturing Company , Ltd.
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