Semiconductor device and method of forming stepped-down RDL...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration

Reexamination Certificate

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Details

C257S620000, C257S621000, C257SE23179

Reexamination Certificate

active

08080882

ABSTRACT:
A semiconductor die has a peripheral region around the die. An insulating layer is formed over the semiconductor die. A portion of the insulating layer and peripheral is removed to form a recess around the semiconductor die. A conductive layer is deposited over the insulating layer and recess. The conductive layer is electrically connected to contact pads on the semiconductor die and conforms to a step into the recess. A gap is created through the conductive layer and peripheral region around the semiconductor die. An insulating material is deposited in the gap. A portion of the insulating material is removed to form a through hole via (THV). A conductive material is deposited in the THV to form a conductive THV. The conductive THV is recessed with respect to a surface of the semiconductor die. The conductive THV is electrically connected to the conductive layer.

REFERENCES:
patent: 6391685 (2002-05-01), Hikita et al.
patent: 6420244 (2002-07-01), Lee
patent: 6852607 (2005-02-01), Song et al.
patent: 7215033 (2007-05-01), Lee et al.
patent: 7276799 (2007-10-01), Lee et al.
patent: 7528477 (2009-05-01), Jeung et al.

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