Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2006-11-14
2006-11-14
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S330000, C430S290000, C438S016000, C438S007000, C356S957000
Reexamination Certificate
active
07135259
ABSTRACT:
A method of determining temperatures at localized regions of a substrate during processing of the substrate in a photolithography process includes the following steps: independently illuminating a photoresist layer including a photoresist pattern at a plurality of locations on the substrate with a light source, so that light is diffracted off the plurality of locations of the photoresist pattern; measuring the diffracted light from the plurality of locations to determine measured diffracted values associated with respective locations from the plurality of locations; and comparing the measured diffracted values against a library to determine a pre-illumination process temperature of the photoresist layer at the plurality of locations.
REFERENCES:
patent: 5156461 (1992-10-01), Moslehi et al.
patent: 5823681 (1998-10-01), Cabib et al.
patent: 5926690 (1999-07-01), Toprac et al.
patent: 6051349 (2000-04-01), Yoshioka et al.
patent: 6081658 (2000-06-01), Rieger et al.
patent: 6289499 (2001-09-01), Rieger et al.
patent: 6350390 (2002-02-01), Liu et al.
patent: 6388253 (2002-05-01), Su
patent: 6423457 (2002-07-01), Bell
patent: 6433878 (2002-08-01), Niu et al.
patent: 6625512 (2003-09-01), Goodwin
patent: 6630361 (2003-10-01), Singh et al.
patent: 6645780 (2003-11-01), Sonderman et al.
patent: 6658144 (2003-12-01), Hatab
Allgair et al., “Manufacturing Considerations for Implementation of Scatterometry for Process Monitoring”, Metrology, Inspection, and Process Control for Microlithography XIV, Proceedings of SPIE vol. 3998, 2000, pp. 125-134.
Bishop et al., “Grating Line Shape Characterization Using Scatterometry”, SPIE vol. 1545 International Conference on the Application and Theory of Periodic Structures (1991), pp. 64-73.
Chen Li-Jui
Gau Tsai-Sheng
Ho Bang-Ching
Ke Chih-Ming
Shih Jen-Chieh
Chacko-Davis Daborah
Duane Morris LLP
McPherson John A.
Taiwan Semiconductor Manufacturing Co. Ltd.
LandOfFree
Scatterometric method of monitoring hot plate temperature... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Scatterometric method of monitoring hot plate temperature..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scatterometric method of monitoring hot plate temperature... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3677969