Sample inspection apparatus and sample inspection method

Details Sample inspection apparatus and sample inspection method Sample inspection apparatus and sample inspection method

1997-05-12

1998-10-27

Evans, F. L.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

356237, G01B 1100, H01L 2100

Patent

active

058284575

ABSTRACT:
A sample detection apparatus includes a light radiation unit, having an illumination lens and an objective lens, for radiating light on a sample on which a pattern relating to fabrication of a semiconductor device is formed. A light receiving unit detects a light transmission image of the pattern on the sample on which the light has been radiated by the light radiation unit. A determination unit determines a presence/absence of a defect of the pattern obtained by the light receiving unit with reference data relating to the pattern, and a control unit controls a ratio .sigma. of a numerical aperture of the objective lens, in accordance with a type of the pattern.

REFERENCES:
patent: 4952058 (1990-08-01), Noguchi et al.
patent: 5379348 (1995-01-01), Watanabe et al.
patent: 5404410 (1995-04-01), Tojo et al.

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