RF measurement feedback control and diagnostics for a plasma...

Details RF measurement feedback control and diagnostics for a plasma... RF measurement feedback control and diagnostics for a plasma...

2004-10-23

2010-02-23

Padgett, Marianne L (Department: 1792)

Coating processes

Measuring, testing, or indicating

C427S523000, C427S526000, C427S527000, C438S014000, C438S005000, C438S010000, C438S514000, C438S513000

Reexamination Certificate

active

07666464

ABSTRACT:
A method of measuring ion dose in a plasma immersion ion implantation reactor during ion implantation of a selected species into a workpiece includes placing the workpiece on a pedestal in the reactor and feeding into the reactor a process gas comprising a species to be implanted into the workpiece, and then coupling RF plasma source power to a plasma in the reactor. It further includes coupling RF bias power to the workpiece by an RF bias power generator that is coupled to the workpiece through a bias feedpoint of the reactor and measuring RF current at the feedpoint to generate a current-related value, and then integrating the current-related over time to produce an ion implantation dose-related value.

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