Releasing a workpiece from an electrostatic chuck

Details Releasing a workpiece from an electrostatic chuck Releasing a workpiece from an electrostatic chuck

1995-01-27

1997-03-18

Fleming, Fritz M.

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

H02N 1300

Patent

active

056128509

ABSTRACT:
Method and apparatus for releasing a workpiece, such as a semiconductor wafer, from an electrostatic chuck. A "dechucking" voltage is applied to the chuck electrode having the same polarity as was used to retain the workpiece, but having a different magnitude selected to minimize the electrostatic attractive force between the workpiece and the chuck. There is an optimum value for the dechucking voltage which minimizes this force. The optimum value can be determined empirically, or it can be determined by a method based on the value of the current pulse produced when the workpiece is first mounted on the chuck.

REFERENCES:
patent: 5325261 (1994-06-01), Horwitz
patent: 5459632 (1995-10-01), Birany et al.

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