Refractive projection objective for immersion lithography

Details Refractive projection objective for immersion lithography Refractive projection objective for immersion lithography

2007-01-04

2008-08-05

Mack, Ricky L (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S770000, C355S067000

Reexamination Certificate

active

07408716

ABSTRACT:
A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.

REFERENCES:
patent: 4480910 (1984-11-01), Takahashi et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 7187503 (2007-03-01), Rostalski et al.
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0004757 (2004-01-01), Schuster
patent: 2005/0231814 (2005-10-01), Rostalski et al.
patent: 102 24 361 (2003-11-01), None
patent: 0 605 103 (1994-07-01), None
patent: 10-303114 (1998-11-01), None
patent: WO 03/077036 (2003-09-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 03/077037 Q1 (2003-09-01), None
patent: WO 03-093904 (2003-11-01), None
U.S. Appl. No. 60/632,550, filed Oct. 20, 2005, Rostalski et al.
M. Switkes and M. Rothschild, “Immersion Lithography at 157nm”, J. Vac. Sci. Technol. B, Nov./Dec. 2001, pp. 2353-2356, vol. 19, No. 6.

Affiliated with

Also associated with

Rating

Refractive projection objective for immersion lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Refractive projection objective for immersion lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Refractive projection objective for immersion lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4012385