Refractive projection objective for immersion lithography

Details Refractive projection objective for immersion lithography Refractive projection objective for immersion lithography

2007-03-06

2007-03-06

Mack, Ricky (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S770000, C355S067000

Reexamination Certificate

active

11011610

ABSTRACT:
A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.

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M. Switkes and M. Rothschild, “Immersion Lithography at 157nm”, J. Vac. Sci. Technol. B, Nov./Dec. 2001, pp. 2353-2356, vol. 19, No. 6.
U.S. Appl. No. 60/632,550, filed Oct. 20, 2005, Rostalski et al.

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