4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Cissy S. Leung

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Plasma-inert cover and plasma cleaning process

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma-inert cover and plasma cleaning process and apparatus emp

Coating apparatus – Gas or vapor deposition – Work support
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Reducing backside deposition in a substrate processing apparatus

Coating apparatus – Gas or vapor deposition – Work support
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Profile ID: LFUS-PAI-P-1154458

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