Coating apparatus – Gas or vapor deposition – Chamber seal
Reexamination Certificate
2005-08-09
2005-08-09
Lund, Jeffrie R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
Chamber seal
C118S715000, C156S345310, C156S345320
Reexamination Certificate
active
06926775
ABSTRACT:
Reactors having gas distributors for depositing materials onto micro-device workpieces, systems that include such reactors, and methods for depositing materials onto micro-device workpieces are disclosed herein. In one embodiment, a reactor for depositing materials onto a micro-device workpiece includes a reaction chamber, a passageway, and a door assembly. The reaction chamber includes a gas distributor configured to provide a flow of gas(es) to a micro-device workpiece on a workpiece holder. The passageway, which has a first end open to the reaction chamber and a second end apart from the reaction chamber, is configured to provide ingression to and egression from the chamber for processing the micro-device workpiece. The door assembly is configured to open and sealably close a door at the second end of the passageway. A gas conditioning system positioned in the door is configured to maintain a desired concentration and phase of gas constituents in the passageway.
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Carpenter Craig M.
Dando Ross S.
Dynka Danny
Lund Jeffrie R.
Perkins Coie LLP
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