Reactor chamber self-cleaning process

Details Reactor chamber self-cleaning process Reactor chamber self-cleaning process

1989-12-19

1990-10-02

Lacey, David L.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 134 1, 20429831, 20429833, B08B 700, C23F 112, H01L 21306

Patent

active

049604880

ABSTRACT:
A process for cleaning a reactor chamber both locally adjacent the RF electrodes and also throughout the chamber and the exhaust system to the including components such as the throttle valve. Preferably, a two-step continuous etch sequence is used in which the first step uses relatively high pressure, close electrode spacing and fluorocarbon gas chemistry for etching the electodes locally and the second step uses relatively lower pressure, farther electrode spacing and fluorinated gas chemistry for etching throughout the chamber and exhaust system. The local and extended etch steps may be used separately as well as together.

REFERENCES:
patent: 4529474 (1985-07-01), Fujiyama et al.
patent: 4534816 (1985-08-01), Chen et al.
patent: 4657616 (1987-04-01), Benzing et al.

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