Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-08-29
2006-08-29
Lee, John R. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492220, C250S492300, C430S296000
Reexamination Certificate
active
07098468
ABSTRACT:
A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.
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Almogy Gilad
Aloni Meir
Friedman Mula
Lehman Yonatah
Litman Alon
Applied Materials Inc.
Fahmi Tarek N.
Lee John R.
Yantorno Jennifer
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