Radiation-sensitive mixture comprising a basic iodonium compound

Details Radiation-sensitive mixture comprising a basic iodonium compound Radiation-sensitive mixture comprising a basic iodonium compound

1995-04-12

1997-09-02

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430156, 430170, 4302711, G03F 7039

Patent

active

056630352

ABSTRACT:
A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.
The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4789619 (1988-12-01), Ruckert et al.
Roeschert et al., "Critical Process Parameters Of An Acetal Based Deep UV Photoresist", Advances in Resist Technology And Processing IX, vol. 1672:33-45, (1992).
MacDonald et al., "Airborne Chemical Contamination of a Chemically Amplified Resist", Advances in Resist Technology And Processing VIII, vol. 1466:2-13, (1991).
Schlegel et al., "Determination of Acid Diffusion in Chemical Amplification Positive a Deep-UV Resists", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 3132-3137, (1991).
Nakamura et al., "Effect of Acid Diffusion on Resolution Of a Chemically Amplified Resist in X-Ray Lithography", Japanese Journal of Applied Physics, vol. 30, No. 10, pp. 2619-2625, (1991).
Crivello, "Applications of Photoinitiated Cationic Polymerization Toward The Development of New Photoresists", General Electric Corporation Research and Development Center Schenectady, pp. 65-69.
Crivello, "Cationic Polymerization--Iodonium And Sulfonium Salt Photoinitiators", Advances in Polymer Science, vol. 62:1-48, (1984).

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