Projection system for EUV lithography

Details Projection system for EUV lithography Projection system for EUV lithography

2006-12-19

2006-12-19

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000, C359S859000

Reexamination Certificate

active

07151592

ABSTRACT:
An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.

REFERENCES:
patent: 4701035 (1987-10-01), Hirose
patent: 4757354 (1988-07-01), Sato et al.
patent: 5063586 (1991-11-01), Jewell et al.
patent: 5071240 (1991-12-01), Ichihara et al.
patent: 5078502 (1992-01-01), Cook
patent: 5153898 (1992-10-01), Suzuki et al.
patent: 5212588 (1993-05-01), Viswanathan et al.
patent: 5220590 (1993-06-01), Bruning et al.
patent: 5272568 (1993-12-01), DeJager
patent: 5315629 (1994-05-01), Jewell et al.
patent: 5353322 (1994-10-01), Bruning et al.
patent: 5410434 (1995-04-01), Shafer
patent: 5686728 (1997-11-01), Shafer
patent: 5805365 (1998-09-01), Sweatt
patent: 5815310 (1998-09-01), Williamson
patent: 5956192 (1999-09-01), Williamson
patent: 5973826 (1999-10-01), Chapman et al.
patent: 6014252 (2000-01-01), Shafer
patent: 6033079 (2000-03-01), Hudyma
patent: 6072852 (2000-06-01), Hudyma
patent: 6109756 (2000-08-01), Takahashi
patent: 6142641 (2000-11-01), Cohen et al.
patent: 6172825 (2001-01-01), Takahashi
patent: 6183095 (2001-02-01), Hudyma
patent: 6188513 (2001-02-01), Hudyma et al.
patent: 6199991 (2001-03-01), Braat
patent: 6226346 (2001-05-01), Hudyma
patent: 6255661 (2001-07-01), Braat
patent: 6262836 (2001-07-01), Hudyma et al.
patent: 6522716 (2003-02-01), Murakami et al.
patent: 199 06 001 (1999-02-01), None
patent: 19948240 (1999-10-01), None
patent: 199 48 240 (2000-08-01), None
patent: 0 779 528 (1997-06-01), None
patent: 0779528 (1997-06-01), None
patent: 0779528 (1997-06-01), None
patent: 0816892 (1998-01-01), None
patent: 63014112 (1988-01-01), None
patent: 07283116 (1995-10-01), None
patent: 9957596 (1999-11-01), None
patent: WO 99/57596 (1999-11-01), None
patent: WO 99/57606 (1999-11-01), None
patent: 0151979 (2001-07-01), None
patent: 0248796 (2002-06-01), None
“Design of Reflective Relay For Soft X-Ray Lithography”, by Rodgers and Jewell, SPIE vol. 1354 International Lens Design Conference(1990).
“Phase Shifting Diffraction Interferometry for Measuring Extreme Ultraviolet Optics”, by Sommargren, OSA TOPS on Extreme Ultraviolet Lithography, 1996, vol. 4, Kubiak and Dania (eds.).
“Ring-Field EUVL Camera With Large Etendu”, by Sweatt, OSA TOPS on Extreme Ultraviolet Lithography, 1996, vol. 4, Kubiak and Dania (eds.).
“EUV Optical Design for a 100 nm CD Imaging System”, by Sweeney, Hudyma, Chapman, and Shafer, SPIE vol. 3331.
“Optical System Design Issues in Development of Projection Camera for EUV Lithography”, Jewell, SPIE vol. 2437.
“Reflective Systems Design Study for Soft X-Ray Projection Lithography”, by Jewell, Rodgers, and Thompson,J. Vac. Sci. Tehnol. B 8(6), Nov./Dec. 1990-American Vacuum Society.
European Search Report dated Nov. 28, 2005.

Affiliated with

Also associated with

Rating

Projection system for EUV lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection system for EUV lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection system for EUV lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3671356