Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2006-04-11
2006-04-11
Siek, Vuthe (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000, C716S030000
Reexamination Certificate
active
07028277
ABSTRACT:
Each of a method for determining a parasitic capacitance and an apparatus for determining the parasitic capacitance provides for an experimental correlation within a parasitic capacitance model of a series of conductor layer nominal dimensions and spacings with a process related deviation to provide a series of conductor layer actual dimensions and spacings. The method and the apparatus further provide for determining the parasitic capacitance while employing the conductor layer actual dimensions and spacings. The parasitic capacitance is thus determined with enhanced accuracy.
REFERENCES:
patent: 5761080 (1998-06-01), DeCamp et al.
patent: 6061508 (2000-05-01), Mehrotra et al.
patent: 6068660 (2000-05-01), Lu
patent: 6182269 (2001-01-01), Laubhan
patent: 6243653 (2001-06-01), Findley
patent: 6430729 (2002-08-01), Dewey et al.
patent: 6436807 (2002-08-01), Cwynar et al.
patent: 6449754 (2002-09-01), You et al.
patent: 6542834 (2003-04-01), Dixit
patent: 6543035 (2003-04-01), Ohba et al.
patent: 6606729 (2003-08-01), Gross et al.
patent: 6643831 (2003-11-01), Chang et al.
patent: 6728937 (2004-04-01), Wakita et al.
patent: 6779157 (2004-08-01), Kondo
patent: 2003/0101418 (2003-05-01), Draxler et al.
patent: 2003/0237064 (2003-12-01), White et al.
Chang Victor C. Y.
Chen Chien-Wen
Chia Yu-Tai
Chiang Chung-Shi
Chuang Harry
Taiwan Semiconductor Manufacturing Co. Ltd.
Tung & Assoc
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