4. Semiconductor device manufacturing: process
  5. With measuring or testing
  6. Electrical characteristic sensed

Chung-Shi Chiang

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Characterization methodology for the thin gate oxide device

Semiconductor device manufacturing: process – With measuring or testing – Electrical characteristic sensed
Reexamination Certificate

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Process related deviation corrected parasitic capacitance...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2771083

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