Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-05-05
1997-04-22
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419217, 427123, 4273766, 4273831, 148277, 148282, 438768, C23C 1434
Patent
active
056226080
ABSTRACT:
A process for preparing an oxidation resistant, electrically conductive copper layer on a substrate, and copper layers so formed, are disclosed. A copper layer is deposited onto the surface of a substrate, and subsequently annealed. The copper layer includes magnesium in an amount sufficient to form an inert magnesium oxide layer at the surface of the copper layer upon annealing.
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Ding Peijun
Lanford William A.
Nguyen Nam
Research Foundation of State University of New York
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