Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2007-01-16
2007-01-16
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298150, C118S720000, C118S721000, C118S728000, C118S504000, C156S345510
Reexamination Certificate
active
10804254
ABSTRACT:
Apparatus for supporting a substrate such as a semiconductor wafer in a process chamber to improve power coupling through the substrate. The apparatus contains a pedestal assembly and a pedestal cover positioned over the top surface of and circumscribing the pedestal assembly for electrically isolating the pedestal assembly. The pedestal cover reduces conductive film growth in the wafer process region. As such, RF wafer biasing power from the pedestal assembly remains coupled through the substrate during processing.
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Delaurentis Eric
Forster John C.
Gopalraja Praburam
Kaburaki Mitsuhiro
Rodriguez Patricia
Applied Materials Inc.
McDonald Rodney G.
Patterson & Sheridan LLP
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