Process for silylating photoresists in the UV range

Details Process for silylating photoresists in the UV range Process for silylating photoresists in the UV range

2006-05-16

2006-05-16

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S311000, C430S315000, C430S270100, C430S324000, C430S326000, C430S330000, C502S167000

Reexamination Certificate

active

07045273

ABSTRACT:
A process for the amplification of structured resists utilizes a reaction between a nucleophilic group and an isocyanate group or thiocyanate group to link an amplification agent to a polymer present in the photoresist. The isocyanate group or the thiocyanate group in addition to the nucleophilic group form a reaction pair. One of the partners is provided on the polymer and the other partner on the amplification agent. The amplification reaction takes place more rapidly than a linkage to carboxylic anhydride groups. Furthermore, the amplification reaction permits the use of polymers that have high transparency at short wavelengths of less than 200 nm, in particular 157 nm.

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