Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2006-07-04
2006-07-04
Barreca, Nicole (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S290000, C430S311000, C430S313000, C430S950000
Reexamination Certificate
active
07070914
ABSTRACT:
Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate ofλ2nwherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
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Ding-Lee Shuji
Neisser Mark O.
Oberlander Joseph E.
Sakamuri Raj
Toukhy Medhat A.
AZ Electronic Materials USA Corp.
Barreca Nicole
Jain Sangya
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