Process chamber component having electroplated yttrium...

Details Process chamber component having electroplated yttrium... Process chamber component having electroplated yttrium...

2008-05-13

2008-05-13

Lavilla, Michael E. (Department: 1794)

Stock material or miscellaneous articles

All metal or with adjacent metals

Composite; i.e., plural, adjacent, spatially distinct metal...

C428S633000, C428S660000, C422S241000, C118S506000, C118S715000

Reexamination Certificate

active

10824123

ABSTRACT:
A component capable of being exposed to a plasma in a process chamber has a structure having an electroplated coating comprising yttrium-containing species. The electroplated coating is resistant to corrosion in the plasma, and can have a compositional gradient of yttrium-containing species through a thickness of the coating. In one embodiment, the coating is formed by electroplating a layer comprising yttrium onto the surface, and then electroplating a second layer onto the first layer, and annealing the first and second layers. The second layer can comprise aluminum or zirconium. In another embodiment, the coating is formed by electroplating a layer comprising a mixture of aluminum and yttrium onto the surface and annealing the layer.

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