Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2007-03-13
2007-03-13
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S311000, C430S313000, C430S394000, C355S067000
Reexamination Certificate
active
10993603
ABSTRACT:
The present invention provides methods and apparatus for accomplishing a strong phase shift direct write lithography process using reconfigurable optical mirrors. A maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used to generate strong phase shift optical patterns which are directed onto a photoimageable layer of a substrate in order to facilitate pattern transfer. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement.
REFERENCES:
patent: 2005/0068510 (2005-03-01), Bleeker et al.
patent: 2006/0068334 (2006-03-01), Sandstrom et al.
Yashesh Shroff et al., “Optical Analysis of Mirror Based Pattern Generation”, Emerging Lithographic Technologies VII, Proceedings of SPIE vol. 5037 (2003), pp. 550-559.
U.S. Appl. No. 60/513,780, filed Oct. 22, 2003.
U.S. Appl. No. 60/535,586, filed Jan. 1, 2004.
U.S. Appl. No. 10/825,342, filed Apr. 14, 2004.
Callan Neal P.
Croffie Ebo H.
Eib Nicholas K.
Beyer & Weaver, LLP
Chacko-Davis Daborah
LSI Logic Corporation
McPherson John A.
LandOfFree
Process and apparatus for generating a strong phase shift... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and apparatus for generating a strong phase shift..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for generating a strong phase shift... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3767417