Abrading – Precision device or process - or with condition responsive... – By optical sensor
Reexamination Certificate
2006-10-10
2006-10-10
Wilson, Lee D. (Department: 3723)
Abrading
Precision device or process - or with condition responsive...
By optical sensor
C451S005000
Reexamination Certificate
active
07118450
ABSTRACT:
The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.
REFERENCES:
patent: 4037367 (1977-07-01), Kruse
patent: 4272024 (1981-06-01), Masuko et al.
patent: 4328068 (1982-05-01), Curtis
patent: 4512847 (1985-04-01), Brunsch et al.
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 4927485 (1990-05-01), Cheng et al.
patent: 4948259 (1990-08-01), Enke et al.
patent: 4954142 (1990-09-01), Carr et al.
patent: 5020283 (1991-06-01), Tuttle
patent: 5081421 (1992-01-01), Miller et al.
patent: 5081796 (1992-01-01), Schultz
patent: 5084071 (1992-01-01), Nenadic et al.
patent: 5132617 (1992-07-01), Leach et al.
patent: 5177908 (1993-01-01), Tuttle
patent: 5196353 (1993-03-01), Sandhu et al.
patent: 5213655 (1993-05-01), Leach et al.
patent: 5234868 (1993-08-01), Cote
patent: 5242524 (1993-09-01), Leach et al.
patent: 5257478 (1993-11-01), Hyde et al.
patent: 5265378 (1993-11-01), Rostoker
patent: 5297364 (1994-03-01), Tuttle
patent: 5329734 (1994-07-01), Yu
patent: 5337015 (1994-08-01), Lustig et al.
patent: 5394655 (1995-03-01), Allen et al.
patent: 5395801 (1995-03-01), Doan et al.
patent: 5413651 (1995-05-01), Otruba
patent: 5413941 (1995-05-01), Koos et al.
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5486129 (1996-01-01), Sandhu et al.
patent: 5489233 (1996-02-01), Cook et al.
patent: 5514245 (1996-05-01), Doan et al.
patent: 5567503 (1996-10-01), Sexton et al.
patent: 5605760 (1997-02-01), Roberts
patent: 5609511 (1997-03-01), Moriyama et al.
patent: 5663797 (1997-09-01), Sandhu
patent: 5672091 (1997-09-01), Takahashi et al.
patent: 5791969 (1998-08-01), Lund
patent: 5838447 (1998-11-01), Hiyama et al.
patent: 5893796 (1999-04-01), Birang et al.
patent: 5910043 (1999-06-01), Manzonie et al.
patent: 5949927 (1999-09-01), Tang
patent: 5964643 (1999-10-01), Birang et al.
patent: 6045439 (2000-04-01), Birang et al.
patent: 6068539 (2000-05-01), Bajaj et al.
patent: 6146248 (2000-11-01), Jairath et al.
patent: 6159073 (2000-12-01), Wiswesser et al.
patent: 6171181 (2001-01-01), Roberts et al.
patent: 6179709 (2001-01-01), Redeker et al.
patent: 6190234 (2001-02-01), Swedek et al.
patent: 6224460 (2001-05-01), Dunton et al.
patent: 6247998 (2001-06-01), Wiswesser et al.
patent: 6248130 (2001-06-01), Perry
patent: 6280289 (2001-08-01), Wiswesser et al.
patent: 6280290 (2001-08-01), Birang et al.
patent: 6336841 (2002-01-01), Chang
patent: 6383058 (2002-05-01), Birang et al.
patent: 6524164 (2003-02-01), Tolles
patent: 6537133 (2003-03-01), Birang et al.
patent: 6676717 (2004-01-01), Birang et al.
patent: 6719818 (2004-04-01), Birang et al.
patent: 6910944 (2005-06-01), Birang et al.
patent: 0 663 265 (1995-07-01), None
patent: 0 738 561 (1996-10-01), None
patent: 0 846 040 (1997-02-01), None
patent: 0 881 040 (1998-12-01), None
patent: 0 881 484 (1998-12-01), None
patent: 1075634 (1954-10-01), None
patent: 57-138575 (1982-08-01), None
patent: 58-004353 (1983-01-01), None
patent: 58-178526 (1983-10-01), None
patent: 62-190726 (1987-08-01), None
patent: 62-190728 (1987-08-01), None
patent: 62211927 (1987-09-01), None
patent: 2222533 (1990-09-01), None
patent: 3-234467 (1991-10-01), None
patent: 5138531 (1993-06-01), None
patent: 5-309558 (1993-11-01), None
patent: 60-37076 (1994-02-01), None
patent: 7-052032 (1995-02-01), None
patent: 9-36072 (1997-01-01), None
patent: WO93/20976 (1993-10-01), None
patent: WO 94/07110 (1994-03-01), None
Anonymous, Endpoint Detection of Oxide Polishing and Planarization of Semiconductor Devices, Research Disclosure No. 340, Kenneth Mason Publication, Ltd., Aug. 1992.
Rodel, “Glass Polishing Pad”, Jan. 1993.
Birang Manoocher
Gleason Allan
Guthrie William L.
Applied Materials Inc.
Fish & Richardson
Wilson Lee D.
LandOfFree
Polishing pad with window and method of fabricating a window... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polishing pad with window and method of fabricating a window..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing pad with window and method of fabricating a window... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3674128